We investigated the sheet resistance (R-s) and transmittance (T) of seamless two-dimensional networks of 50-nm-thick aluminum (Al) nanowires (NWs) with widths (W) ranging from 380 to 1410nm. The Al NWs were fabricated by wet-etching of Al metalized polyester films with using polystyrene (PS) nanofibers as the mask. The PS nanofibers were deposited by the electrospinning of a PS solution and adhered to the film by annealing. W and the area coverage (phi) were increased with increasing PS solution concentration and deposition time, respectively. With increasing phi from 3 to 34%, T and R-s decreased from 99 to 75% and from 800 to 10 Omega/sq, respectively, and the network with W = 878nm at phi= 0.21 attained values of T = 91% and R-s = 31 Omega/sq. The conductivity increases with phi with an exponent of 2, demonstrating that seamless NW networks are characterized by the zero percolation threshold. (C) 2017 The Japan Society of Applied Physics